Talk:Silicon tetraiodide

Reference needed for using KI as an etchant for silicon

As the comparison of the mp of the silicon halide compounds shows, the mp for silicon iodide is 155 C.

Therefore, if we attempt to make an aqueou solution of KI and etch silicon via formation of silicon iodide,

the SiI4 product will not be soluble up to the boiling point (~100C) of the aqueous solution. Berkeleybill (talk) 21:00, 28 April 2023 (UTC)

My reading is that the article refers to etching Si with SiI4, which would not use water.--Smokefoot (talk) 21:23, 28 April 2023 (UTC)