Oded Hod (Hebrew: עודד הוד) is an Israeli chemist. He is a full professor at the School of Chemistry of Tel Aviv University, and is the Heinemann Chair of Physical Chemistry.[1]

Oded Hod
עודד הוד
Alma mater
Occupation(s)theoretical chemistry, physical chemist
EmployerTel Aviv University
TitleThe Heinemann Chair of Physical Chemistry

Education and career

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In 1991–1994 Hod did his undergraduate studies at the Hebrew University in chemistry (major) and physics (minor) as part of the academic reserve officers' training corps (Atuda).[2] Upon completing his degree, he commenced his army service in the IAF, where he served during 1994–1998. He then moved to the Ministry of Defense, continuing his service until 2000.

In 2000–2005 Hod studied towards a Ph.D. degree in Theoretical Chemistry at Tel Aviv University[2] under the supervision of Eran Rabani and Roi Baer. In 2005–2008 he was a post-doctoral fellow at Rice University, specializing in Computational Chemistry.[citation needed]

In 2010–2012 he headed the Israeli CECAM node, based at Tel Aviv University.[2][3]

In 2012–2017 he was a member of the Israeli Young Academy.[4]

Selected publications

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  • Hod, Oded; Barone, Veronica; Peralta, Juan E.; Scuseria, Gustavo E. (2007-08-08). "Enhanced Half-Metallicity in Edge-Oxidized Zigzag Graphene Nanoribbons". Nano Letters. 7 (8): 2295–2299. arXiv:0704.2043. doi:10.1021/nl0708922. ISSN 1530-6984.
  • Hod, Oded; Barone, Verónica; Scuseria, Gustavo E. (2008-01-10). "Half-metallic graphene nanodots: A comprehensive first-principles theoretical study". Physical Review B. 77 (3): 035411. arXiv:0709.0938. doi:10.1103/PhysRevB.77.035411.
  • Marom, Noa; Bernstein, Jonathan; Garel, Jonathan; Tkatchenko, Alexandre; Joselevich, Ernesto; Kronik, Leeor; Hod, Oded (2010-07-19). "Stacking and Registry Effects in Layered Materials: The Case of Hexagonal Boron Nitride". Physical Review Letters. 105 (4): 046801. arXiv:1002.1728. doi:10.1103/PhysRevLett.105.046801.
  • Hod, Oded (2012-04-10). "Graphite and Hexagonal Boron-Nitride have the Same Interlayer Distance. Why?". Journal of Chemical Theory and Computation. 8 (4): 1360–1369. arXiv:1109.3813. doi:10.1021/ct200880m. ISSN 1549-9618.
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References

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