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| Description | (a) Chemical structures of PMVSOH (HD), P2VP (HA), PtBA (N), PMVS (X) and PFS. (b) Schematic of the assembly processes. TEM images after solvent evaporation of supermicelles formed by (c) mixing HD homopolymer (PMVSOH105) with N-HA-N (540 nm) triblock comicelles (hydroxyl/pyridyl group ratio=5:1); and HD seeds (M(PFS20-b-PMVSOH120), 37 nm) with N-HA-N (1.4 μm) triblock comicelles (hydroxyl/pyridyl group ratio: (d) 20:1 and (e) 1:2) in i-PrOH. Insets in c and d are high magnification images of the HA segments after the adsorption of HD homopolymer and seeds, respectively. Scale bar, 500 or 100 nm (inset). Segments: HA=M(PFS32-b-P2VP448) and N=M(PFS20-b-PtBA280). |
| Date | |
| Source | http://www.nature.com/ncomms/2015/150904/ncomms9127/full/ncomms9127.html |
| Author | Xiaoyu Li et al |
| Permission (Reusing this file) |
  This file is licensed under the Creative Commons Attribution 4.0 International license.
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 04:28, 8 December 2015 | | 946 × 907 (178 KB) | Materialscientist | {{Information |Description=(a) Chemical structures of PMVSOH (HD), P2VP (HA), PtBA (N), PMVS (X) and PFS. (b) Schematic of the assembly processes. TEM images after solvent evaporation of supermicelles formed by (c) mixing HD homopolymer (PMVSOH105) wit... |
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