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Summary
| Description |
English: As pitch decreases, it becomes more necessary to use half-leaf and even quarter-leaf portions of dipole illumination to address EUV 3D mask effects.[1] This results in pupil fill ratio decreasing rapidly as pitch decreases. Below 20% of the pupil, the throughput and dose stability begin to suffer, with the required dose being inversely proportional to the pupil fill.[2] |
| Date | |
| Source | Own work |
| Author | Guiding light |
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- ↑ J-H. Franke et al., Proc. SPIE 11517, 1151716 (2020).
- ↑ J. Zimmerman et al., 2016 International Symposium on Extreme Ultraviolet Lithography, Hiroshima, Japan, 2016-10-24.
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 03:35, 26 January 2021 | | 480 × 288 (9 KB) | Guiding light | Uploaded own work with UploadWizard |
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